1) Possesses the ability to distinguish between true CD and artifacts (e.g., contrast from protective or process layers, and identifying whether structures are measurable).
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1) Possesses the ability to distinguish between true CD and artifacts (e.g., contrast from protective or process layers, and identifying whether structures are measurable).
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1) Possesses the ability to distinguish between true CD and artifacts (e.g., contrast from protective or process layers, and identifying whether structures are measurable).
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Plan MAE and EWAK (workstation equipment and accessories) investments for new and existing lines/products, including cost and feasibility analysis.
Develop workstation layouts based on process definitions from VSE/IE.
Define SRS with the support of Value Stream functions (FPV and QPV), purchase, set up, trial, and buy off all workstations and accessories for new products and automation/improvement projects.
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NPI Execution: Direct the complete NPI lifecycle for complex semiconductor capital equipment, from initial concept and prototyping through to release and volume manufacturing.
Global Team Leadership: Matrix-manage international, cross-functional teams spanning engineering, supply chain, and manufacturing, while successfully integrating external contractors and vendors into the project workflow.
Methodology Compliance: Champion and enforce "Copy Exactly!" (CE!) principles across all design changes, manufacturing processes, and supply chain transitions to ensure absolute process parity and equipment matching.
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